Basic Structure of FinFET
The basic structure of FinFET consist of 3D shaped Fin , gate , drain and source and substrate
- Fin : Name of FinFET is derived from this 3 D vertical shaped fin like structure that act as channel in FinFET . Fin is made of semiconductor material or silicon.
- Gate : Role of gate in FinFET is similar to common MOSFET.Fin of the FinFET surrounds the gate of FinFET and gate form 3 D structure , their can be more than one gate in FinFET . Gate is made up of metal . Gate is used to control the flow of electric current in channel .
- Drain and Source : Drain and source of FinFET plays similar role as in MOSFET . Current enter from source and drain and gate is used to control the current . Carriers in channel enter through source and exist from drain . As in MOSFET , In FinFET also drain is in high potential and source is in low potential.
- Substrate : Substrate of FinFET act a base for whole structure and it helps to isolate device in chips.
FinFET
Semiconductor Industry is a very dynamic industry as it changes from time to time. As per Moore’s Law, the number of transistors present in a chip doubles every 18 months or 2 years. So the size of chips and electronic device get smaller and smaller. The introduction of FinFET technology in the semiconductor industry played a crucial role.
FinFET is a non-planar transistor that has replaced common planar MOSFET. The Introduction of FinFET not only overcame the challenges of common MOSFET but also helped to make the size of the electronic device compact due to its 3D and fin-shaped vertical structure. FinFET has been widely used in mobile, laptops, and IoT devices due to energy efficiency, fast switching speed, and various such advantages.