What is Photoresist in Photolithography?
As a light-sensitive “mask” that enables the transfer of intricate patterns onto a substrate during semiconductor fabrication, photoresist is an essential component of photolithography. It goes through compound changes upon openness to light, taking into consideration the particular evacuation of specific regions during improvement. There are two principal types:
Positive Photoresist
- Exposure Reaction: The photoresist molecules become more soluble when exposed to UV light.
- Development: The patterned resist is left behind after the exposed areas are dissolved in a developer solution.
Negative Photoresist
- Exposure Reaction: UV light makes the photoresist atoms less dissolvable.
- Development: The desired pattern is revealed as areas that were not exposed dissolve.
Sensitivity to particular wavelengths of light, resolution, and the capacity to withstand subsequent process steps are important properties of photoresist. The decision of photoresist type and its attributes influence the accuracy and nature of example moves in the photolithography cycle.
What is Photolithography?
For making perplexing examples on silicon wafers, photolithography is an urgent assembling process. It includes keeping a photosensitive material, called a photoresist, on the wafer’s surface. The resist-coated wafer is covered with a pattern-covered mask, which is illuminated by ultraviolet light.
The resist’s solubility is altered as a result of a chemical reaction brought on by the light’s selective exposure. The resulting improvement eliminates either the uncovered or unexposed districts, abandoning the ideal example. This cycle is rehashed on numerous occasions to make complex coordinated circuits that power our cutting-edge innovation.
- What is Photolithography?
- Photolithography Process
- Steps in Photolithography
- What is Photoresist in Photolithography?
- Types of Photoresist